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Related Experiment Video

Updated: May 23, 2026

Multi-step Variable Height Photolithography for Valved Multilayer Microfluidic Devices

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Published on: January 27, 2017

Enhanced lithographic imaging layer meets semiconductor manufacturing specification a decade early

Yu-Chih Tseng¹, Anil U Mane, Jeffrey W Elam

¹Argonne National Laboratory, Center for Nanoscale Materials, 9700 S. Cass Ave., Argonne, IL, USA.

Advanced Materials (Deerfield Beach, Fla.)

|April 11, 2012

Summary

No abstract available in PubMed .

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