Evaluation of a MEMS-based dual metal-layer thin-film microelectrode array for suprachoroidal electrical stimulation

A double metal-layer thin-film platinum microelectrode array was fabricated for implantation between sclera and choroid based on MEMS processing techniques and photosensitive polyimide material. The array was composed of 60 stimulating sites (6 × 10) and four selectable returning electrodes. The diameter of each stimulating electrode was 350 μ m with a center-to-center spacing of 750 μm. The transient voltage responses of the electrode to current pulse stimulation indicated a charge-injection capacity greater than 52.1 μ C/cm (2) . Acute in vivo animal experiments showed that the implicit time of electrically evoked potentials (EEPs) was 17.09±1.45 ms at a threshold current of 25.55 ±5.43 μA for a full-row of simultaneously stimulated electrodes (i.e., current applied simultaneously to each of the 10 electrodes). Individual electrode stimulation threshold was 48.57 ±6.90 μA. The corresponding threshold charge densities were 13.28 ±2.82 μC/cm (2) and 25.24 ±3.59 μC/cm (2) , respectively. The spatial spread of the maximally recorded P1 response in the EEPs indicated a correspondence between the retinal stimulation site and the focal response location in the cortex. This method of array fabrication is suitable for acute suprachoroidal stimulation, and has a potential use for the fabrication of a visual prosthesis.