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Published on: December 26, 2016
[Self-cleaning and antimicrobial properties of methacrylic acid coupled TiO(2)/PMMA denture base resin]
Jian-xiang Tao1, Xiu-li Song, Yuan-yuan Yao
1Department of Prosthodontics, Tongji University, Shanghai, China. taojxtohoku@hotmail.com
Purpose:
To study the influence of TiO2 and methacrylic acid on self-cleaning and antimicrobial properties of denture base resin.
Methods:
TiO2 (2%, 4%, 6%) and methacrylic acid were respectively added into two makers' denture base resins. The self-cleaning property was assayed with measuring the decomposition of methylthioninium chloride. The antimicrobial property was tested with the pellicle-sticking method. The data were analysed by SPSS 12.0 software package for two-way ANOVA.
Results:
The self-cleaning and antimicrobial properties of samples were improved as TiO2 increased. Methacrylic acid had no significant influence on self-cleaning and antimicrobial properties of the samples. The decomposition ratio and antimicrobial ratio of MTi4% (Rijin) were 53.96% and 71.42%, respectively.
Conclusion:
Methacrylic acid coupled TiO2/PMMA denture base resin enjoys good self-cleaning and antimicrobial properties.
