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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

(UO2)2[UO4(trz)2](OH)2: a U(VI) coordination intermediate between a tetraoxido core and a uranyl ion with

Zhehui Weng1, Shuao Wang, Jie Ling

  • 1Department of Civil Engineering and Geological Sciences, University of Notre Dame, Notre Dame, Indiana 46556, United States.

Inorganic Chemistry
|June 13, 2012
PubMed

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