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Updated: May 20, 2026

Light Enhanced Hydrofluoric Acid Passivation: A Sensitive Technique for Detecting Bulk Silicon Defects
Published on: January 4, 2016
High-amplitude versus low-amplitude current oscillations during the anodic oxidation of p-type silicon in fluoride
Konrad Schönleber1, Katharina Krischer
1Non-equilibrium Chemical Physics, Physik-Department, TU München, James-Franck-Str. 1, 85748 Garching, Germany.
Abstract:
Sustained electrochemical oscillations at p-type Si(100) in a dilute ammonium fluoride electrolyte are investigated by means of ellipsometric intensity and hydrogen measurements. Two main types of oscillations are identified, one with a low and one with a high current amplitude. It is demonstrated that the low-current amplitude oscillations do not involve any variations in oxide quality or etch rate. Furthermore, experimental results suggest that the high-amplitude current oscillations emerge from the low-amplitude current oscillations and thus share the feedback loops causing the oscillatory instability. Hence, the origin of oscillations during anodic dissolution of silicon has to be reconsidered.
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