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Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon
Published on: July 17, 2020
1Hefei National Laboratory for Physical Sciences at Microscale and Department of Physics, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China.
A new tight-binding potential model for germanium (Ge) accurately predicts material properties. This advanced model considers the local bonding environment, proving effective for diverse Ge structures and complex materials.
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