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NbC/Si multilayer mirror for next generation EUV light sources.

Mohammed H Modi¹, S K Rai, Mourad Idir

¹X-ray Optics Section, Raja Ramanna Centre for Advanced Technology Indore 452013, India. modimh@rrcat.gov.in

|July 10, 2012

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Researchers developed a stable niobium carbide/silicon multilayer for high-reflecting soft x-ray mirrors. This new combination shows performance comparable to existing mirrors and maintains stability after heat treatment.

Area of Science:

Materials Science
Optics
X-ray Physics

Background:

Multilayer mirrors are crucial for soft x-ray applications.
Current mirrors like Molybdenum/Silicon (Mo/Si) face stability challenges.

Purpose of the Study:

To develop a novel, stable, and high-reflecting multilayer mirror for the 10-20 nm wavelength region.
To evaluate the thermal stability and structural properties of the new multilayer combination.

Main Methods:

Multilayer structures were fabricated using ion beam sputtering with a niobium carbide compound target.
Grazing incidence x-ray diffraction (GIXRD) was used to analyze structural changes.
Soft x-ray reflectivity measurements were conducted at synchrotron radiation sources (Indus-1 and BESSY-II).

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Main Results:

A new Niobium Carbide/Silicon (NbC/Si) multilayer was successfully created, exhibiting high reflectivity comparable to Mo/Si mirrors.
Annealing at 600°C resulted in a minor ~2.5% drop in reflectivity and a slight decrease in multilayer period.
GIXRD confirmed crystallization of NbC and Si layers, causing compaction, with no silicide formation detected.

Conclusions:

The NbC/Si multilayer offers a stable and high-reflecting alternative for soft x-ray optics.
The material combination demonstrates good thermal stability, suitable for applications requiring moderate heat exposure.
Further research can explore optimization for enhanced reflectivity and broader wavelength applications.