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Updated: May 20, 2026

07:12
A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
MoS2 nanosheets for top-gate nonvolatile memory transistor channel
Hee Sung Lee1, Sung-Wook Min, Min Kyu Park
1Institute of Physics and Applied Physics, Yonsei University, 262 Seongsanno, Seodaemun-gu, Seoul 120-749, Korea.
Small (Weinheim an Der Bergstrasse, Germany)
|August 2, 2012
Summary
No abstract available in PubMed .
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