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Updated: May 19, 2026

Graphene-Assisted Quasi-van der Waals Epitaxy of AlN Film on Nano-Patterned Sapphire Substrate for Ultraviolet Light Emitting Diodes
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Nano- and microstructuring of graphene using UV-NIL.

Iris Bergmair1, Wolfgang Hackl, Maria Losurdo

  • 1Functional Surfaces and Nanostructures, PROFACTOR GmbH, Im Stadtgut A2, A-4407 Steyr-Gleink, Austria. iris.bergmair@profactor.at

Nanotechnology
|August 7, 2012
PubMed
Summary

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UV-nanoimprint lithography enables micro- and nanostructuring of graphene for the first time. This scalable technique allows low-cost manufacturing of graphene-based electronic and optical devices with high electron mobility.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Physics

Background:

  • Graphene's unique electronic and optical properties make it promising for advanced applications.
  • Existing graphene fabrication methods often face challenges in scalability and cost-effectiveness.
  • Precise control over graphene's structure at the micro- and nanoscale is crucial for device performance.

Purpose of the Study:

  • To demonstrate a novel method for micro- and nanostructuring graphene using UV-nanoimprint lithography.
  • To assess the suitability of this technique for large-area patterning on diverse substrates.
  • To evaluate the electronic quality of the structured graphene for potential applications.

Main Methods:

  • Utilized UV-nanoimprint lithography for graphene patterning.

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  • Applied the technique to exfoliated graphene on SiO(2) and chemical vapor deposition (CVD) graphene on nickel and copper substrates.
  • Investigated transferred CVD graphene on dielectric substrates.
  • Characterized the fabricated structures for feature sizes down to 20 nm.

    • Main Results:

    • Successfully achieved micro- and nanostructuring of graphene on various substrates.
    • Demonstrated large-area patterning capability (2 x 2 cm(2)).
    • Fabricated graphene structures with feature sizes as small as 20 nm.
    • Observed high electron mobilities of up to 4.6 x 10(3) cm(2)/V·s in the processed graphene films.

    Conclusions:

    • UV-nanoimprint lithography is a viable technique for micro- and nanostructuring graphene.
    • The method enables low-cost, high-throughput manufacturing of graphene structures.
    • The demonstrated process is suitable for a wide range of graphene-based optical and electronic applications.
    • The resulting graphene structures maintain state-of-the-art electronic quality.