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Atomic layer deposition (ALD): A versatile technique for plasmonics and nanobiotechnology
Hyungsoon Im1, Nathan J Wittenberg, Nathan C Lindquist
1Laboratory of Nanostructures and Biosensing, Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis, MN 55455, United States.
Journal of Materials Research
|August 7, 2012
Summary
Atomic layer deposition (ALD) is a versatile technique now advancing plasmonics and nanobiotechnology. ALD coatings enhance metallic surfaces for optical tuning, protection, and biocompatibility in nanodevices.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Chemistry
Background:
- Atomic layer deposition (ALD) is an established industrial technique for microprocessors and displays.
- Emerging applications leverage ALD for plasmonics and nanobiotechnology.
- ALD offers unique advantages for nanoscale material engineering.
Purpose of the Study:
- To review the key features of Atomic Layer Deposition (ALD).
- To explore the benefits of ALD for plasmonics and nanobiotechnology.
- To highlight ALD's potential in nanosciences and biotechnology.
Main Methods:
- ALD enables conformal deposition of dense, ultra-thin films.
- Processing occurs at temperatures below 100 °C.
- ALD is suitable for high-aspect-ratio nanostructures.
Main Results:
- ALD coatings can tune optical and plasmonic properties of metallic surfaces.
- ALD provides protection against oxidation and contamination.
- ALD facilitates the creation of biocompatible surfaces.
Conclusions:
- ALD is uniquely suited for engineering nanoplasmonic devices.
- ALD's capabilities support advancements in nanosciences and biotechnology.
- The technique offers significant potential for future applications in these fields.
