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Updated: May 19, 2026

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
Published on: June 12, 2018
High-resolution, large-area, serial fabrication of 3D polymer brush structures by parallel dip-pen nanodisplacement
Xuechang Zhou1, Zhilu Liu, Zhuang Xie
1Nanotechnology Center, Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hong Kong SAR, China.
Abstract:
Parallel dip-pen nanodisplacement lithography (p-DNL) is used for high resolution, serial fabrication of 3D structures of polymer brushes over millimeter length scales. With p-DNL, 2D initiator templates consisting of arrays of nanolines and nanodots with rationally designed lateral spacings are fabricated in parallel via a locally tip-induced nanodisplacement process, from which highly defined 3D polymer structures are grown via surface-initiated atom transfer radical polymerization.

