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Updated: May 19, 2026

A Continuous-flow Photocatalytic Reactor for the Precisely Controlled Deposition of Metallic Nanoparticles
Published on: April 10, 2019
Visible-light active photocatalytic WO3 films loaded with Pt nanoparticles deposited by sputtering
Akiyo Murata1, Nobuto Oka, Shinichi Nakamura
1Graduate School of Science and Engineering, Aoyama Gakuin University, 5-10-1 Fuchinobe, Chuo-ku, Sagamihara, Kanagawa 252-5258, Japan.
Abstract:
Visible-Light active photocatalytic tungsten trioxide (WO3) films were deposited at a substrate temperature of 800 degrees C by dc reactive magnetron sputtering using a W metal target. In addition, Platinum (Pt) was deposited on the WO3 film surfaces at room temperature, also by sputtering. In the early stages of Pt growth, formation of Pt nanoparticles could be expected because of the island structure observed in Volmer-Weber-type growth mode. The surface coverage of Pt on the WO3 films was estimated quantitatively by X-ray photoelectron spectroscopy and was found to be approximately 60% after 7 s deposition. High resolution electron microscopy (HREM) demonstrated that Pt nanoparticles with a diameter of about 2.5 nm were generated and dispersed uniformly on the entire surface area of the columnar polycrystalline WO3 films. These Pt-loaded films exhibited high photocatalytic activity in the decomposition of acetaldehyde (CH3CHO) under visible light irradiation.
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