Wafer scale imprint uniformity evaluated by LSPR spectroscopy: a high volume characterization method for nanometer
Claus Jeppesen1, Daniel Nilsson Lindstedt, Asger Laurberg Vig
1Department of Photonics Engineering, Technical University of Denmark, DTU Fotonik, Kongens Lyngby, Denmark. clje@fotonik.dtu.dk
Nanotechnology
|September 6, 2012
Summary
Localized surface-plasmon resonance (LSPR) spectroscopy uses terahertz gold gammadions for nanostructure metrology. This optical method offers a promising alternative to traditional techniques for critical dimension measurements.
Area of Science:
- Nanotechnology
- Metrology
- Plasmonics
Background:
- Critical dimension (CD) metrology is crucial for nanostructure fabrication.
- Existing methods like SEM, AFM, and scatterometry have limitations.
- Terahertz (THz) frequencies offer unique probing capabilities.
Purpose of the Study:
- To develop and validate a novel wafer-scale metrology technique for nanostructures.
- To utilize localized surface-plasmon resonance (LSPR) for critical dimension measurements.
- To establish LSPR spectroscopy as a viable alternative to conventional characterization methods.
Main Methods:
- Fabrication of terahertz gold gammadion structures.
- Implementation of LSPR spectroscopy based on optical transmission measurements.
- Benchmarking against numerical simulations and atomic force microscopy (AFM) data.
Main Results:
- Demonstrated wafer-scale capability for nanostructure metrology.
- Achieved fair agreement between LSPR spectroscopy and AFM-characterized simulations.
- Showcased the translation of optical spectra to physical critical dimensions.
Conclusions:
- LSPR spectroscopy is a promising non-contact, optical characterization method.
- It offers a potential alternative to scanning electron microscopy (SEM), AFM, and scatterometry.
- The technique holds potential for efficient nanostructure metrology in fabrication processes.
