Nanocrystalline diamond coating on non-planar silicon substrates

Area of Science:

• Micro and Nanosystems Engineering
• Materials Science
• Nanotechnology

Background:

• Micro and nanosystems are crucial for future industrial and economic growth, adding value across various sectors.
• Advanced manufacturing technologies enable functionality and intelligence in miniaturized systems using diverse materials.
• Chemical Vapour Deposited (CVD) diamond offers exceptional hardness, mechanical strength, and thermal stability, making it suitable for microelectromechanical devices.

Purpose of the Study:

• To present results of diamond-coated structures.
• To evaluate the morphology variations of CVD diamond films in relation to substrate configuration.
• To explore the potential of CVD diamond in micro and nanosystems applications.

Main Methods:

• Fabrication of diamond-coated structures using Chemical Vapour Deposition (CVD).
• Controlled deposition on structured substrates, including selective growth on Silicon (Si) using Silicon Dioxide (SiO2) masks.
• Characterization of grown diamond films using Scanning Electron Microscopy (SEM), Raman Spectroscopy, X-ray Diffraction (XRD), and surface profilometry.

Main Results:

• Successful deposition of diamond films on various substrate configurations.
• Detailed characterization of film quality, surface roughness, and microstructure.
• Demonstrated variation in diamond morphology influenced by the substrate's geometric and material properties.

Conclusions:

• CVD diamond is a viable material for microelectromechanical devices, offering superior properties.
• Substrate configuration significantly influences the morphology and quality of the deposited diamond films.
• Fine-tuning nucleation and growth processes, alongside substrate design, allows for controlled diamond shaping for micro and nanosystems.