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Applying Dynamic Strain on Thin Oxide Films Immobilized on a Pseudoelastic Nickel-Titanium Alloy
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Impact of strain engineering on nanoscale strained III-V PMOSFETs

S T Chang1, Y C Liu, H Ou-Yang

  • 1Department of Electrical Engineering, National Chung Hsing University, Taichung 40227, Taiwan, R.O.C.

Journal of Nanoscience and Nanotechnology
|September 13, 2012
PubMed

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