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Ultrahigh Density Array of Vertically Aligned Small-molecular Organic Nanowires on Arbitrary Substrates
Published on: June 18, 2013
Microplasma-based synthesis of vertically aligned metal oxide nanostructures
Travis L Koh1, Evan C O'Hara, Michael J Gordon
1Department of Chemical Engineering, University of California Santa Barbara, Santa Barbara, CA 93106-5080, USA.
Nanotechnology
|October 6, 2012
Summary
Vertically aligned metal oxide nanostructures like CuO, PdO, and NiO were grown using a microplasma technique. This method enables large-area deposition of these nanostructures on substrates such as silicon and indium tin oxide.
Area of Science:
- Materials Science
- Nanotechnology
- Plasma Physics
Background:
- Metal oxide nanostructures exhibit unique properties for various applications.
- Controlled synthesis of vertically aligned nanostructures is challenging.
- Microplasma technology offers a novel approach for materials synthesis.
Purpose of the Study:
- To synthesize vertically aligned metal oxide nanostructures (CuO, PdO, NiO) on Si and ITO substrates.
- To investigate the use of a high-pressure microplasma-based growth technique for nanostructure fabrication.
- To explore the potential for large-area deposition of these nanostructures.
Main Methods:
- Utilized a high-pressure microplasma jet with organometallic precursors.
- Dissociated precursors in a supersonic plasma jet to create a directed flux of metal species.
- Controlled reaction with oxygen background to form crystalline metal oxide films with diverse nanomorphologies.
Main Results:
- Successfully synthesized vertically aligned CuO, PdO, and NiO nanostructures.
- Observed spiral-like growth fronts in CuO, suggesting screw dislocation involvement.
- Achieved large-area (>1 cm²) nanowire films with good adhesion and electrical connection to ITO.
Conclusions:
- The microplasma-based growth technique is effective for synthesizing vertically aligned metal oxide nanostructures.
- The method allows for controlled nanomorphology and large-area deposition.
- Potential for applications requiring conductive metal oxide nanostructured films.
