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Updated: May 17, 2026

08:12
Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
Published on: December 5, 2015
Electric-field screening in atomically thin layers of MoS₂: the role of interlayer coupling
Andres Castellanos-Gomez1, Emmanuele Cappelluti, Rafael Roldán
1Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands. a.castellanosgomez@tudelft.nl
Advanced Materials (Deerfield Beach, Fla.)
|November 3, 2012
Abstract
No abstract available in PubMed .
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