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Related Experiment Video

Updated: May 16, 2026

Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon
06:57

Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon

Published on: July 17, 2020

Improving CMOS-compatible Germanium photodetectors.

Guoliang Li1, Ying Luo, Xuezhe Zheng

  • 1Oracle Labs, Oracle, San Diego, California 92121, USA. glenn.li@oracle.com

Optics Express
|November 29, 2012
PubMed
Summary

We improved germanium photodetectors for better performance. These devices show high responsivity and low capacitance, ideal for optical communication systems.

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Area of Science:

  • Optoelectronics
  • Semiconductor device physics
  • Integrated photonics

Background:

  • Germanium photodetectors are crucial for optical communications.
  • Existing designs face challenges in achieving high performance and low capacitance.
  • Low-temperature growth is essential for CMOS integration.

Purpose of the Study:

  • To enhance the design of evanescently coupled Germanium photodetectors.
  • To improve responsivity and reduce capacitance for C-band operation.
  • To enable integration within commercial CMOS processes.

Main Methods:

  • Low-temperature growth of Germanium.
  • Design optimization for evanescent coupling.
  • Fabrication using a commercial CMOS process.

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Related Experiment Videos

Last Updated: May 16, 2026

Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon
06:57

Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon

Published on: July 17, 2020

Developing High Performance GaP/Si Heterojunction Solar Cells
10:31

Developing High Performance GaP/Si Heterojunction Solar Cells

Published on: November 16, 2018

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
12:38

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium

Published on: December 16, 2011

  • Performance characterization including responsivity and capacitance measurement.
  • Main Results:

    • Achieved responsivity greater than 0.8 A/W across the entire C-band.
    • Demonstrated device capacitance below 7 fF for 10 μm Ge length detectors.
    • Successful integration of improved photodetectors in a commercial CMOS platform.

    Conclusions:

    • The design improvements lead to high-performance Germanium photodetectors.
    • The achieved parameters are suitable for advanced optical communication applications.
    • Low-temperature grown, evanescently coupled Germanium photodetectors offer a promising solution for integrated photonics.