Echelle grating silicon multi/demultiplexers with single-reflection total internal reflectors
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Updated: May 16, 2026

Fabrication of High Contrast Gratings for the Spectrum Splitting Dispersive Element in a Concentrated Photovoltaic System
Published on: July 18, 2015
Sahnggi Park1, Sang-Gi Kim, Jeagyu Park
1Electronics and Telecommunications Research Institute, 161 Gajong-dong, Yusong-gu, Daejeon, 305-350, South Korea. sahnggi@etri.re.kr
Abstract:
We present a silicon-on-insulator Echelle grating 8-channel demutiplexer showing characteristic features, average insertion loss 2.4 dB measured at 1520~1570 nm, adjacent channel crosstalk 15-18 dB, and channel spacing 11.9 nm. Our Echelle grating is remarked by a total internal reflector (TIR) which reflects incident light by a single reflection in contrast to the double reflections of retro-reflector TIR Echelle gratings.

