Integration of a broad beam ion source with a high-temperature x-ray diffraction vacuum chamber

Here, the integration of a low energy, linearly variable ion beam current density, mechanically in situ adjustable broad beam ion source with a high-temperature x-ray diffraction (XRD) vacuum chamber is reported. This allows in situ XRD investigation of phase formation and evolution processes induced by low energy ion implantation. Special care has been taken to an independent adjustment of the ion beam for geometrical directing towards the substrate, a 15 mm small ion source exit aperture to avoid a secondary sputter process of the chamber walls, linearly variable ion current density by using a pulse length modulation (PLM) for the accelerating voltages without changing the ion beam density profile, nearly homogeneous ion beam distribution over the x-ray footprint, together with easily replaceable Kapton(®) windows for x-rays entry and exit. By combining a position sensitive x-ray detector with this PLM-modulated ion beam, a fast and efficient time resolved investigation of low energy implantation processes is obtained in a compact experimental setup.