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Updated: May 15, 2026

Fabrication of Micro-Patterned Chip with Controlled Thickness for High-Throughput Cryogenic Electron Microscopy
Published on: April 21, 2022
1College of Nanoscale Science and Engineering, University at Albany-SUNY, Albany, NY 12203, USA.
Direct-write three-dimensional nanolithography using cryogenic electron beam-induced deposition (EBID) achieves high resolution. This method significantly enhances condensate exposure efficiency compared to room temperature processes.
11:03Nanoscale Characterization of Liquid-Solid Interfaces by Coupling Cryo-Focused Ion Beam Milling with Scanning Electron Microscopy and Spectroscopy
Published on: July 14, 2022
10:25Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
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