Related Experiment Video
Updated: May 15, 2026

07:47
Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
Published on: February 12, 2017
Polymerization inhibition by triplet state absorption for nanoscale lithography
Benjamin Harke1, William Dallari, Giulia Grancini
1Department of Nanophysics, Istituto Italiano di Tecnologia-IIT, Via Morego 30, 16163 Genova, Italy. benjamin.harke@iit.it
Advanced Materials (Deerfield Beach, Fla.)
|January 11, 2013
Summary
No abstract available in PubMed .

