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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Variable electron beam diameter achieved by a titanium oxide/carbon nanotube hetero-structure suitable for
1Nano-Physics Research Laboratory, Department of Physics, University of Tehran, Tehran, Iran. y.abdi@ut.ac.ir
Nanotechnology
|January 12, 2013
Summary
We developed a novel titanium oxide/carbon nanotube field emission device for nanolithography. This device enables precise electron beam control for fabricating nanoscale transistors and features a sub-30 nm spot size.
Area of Science:
- Materials Science
- Nanotechnology
- Electronics Engineering
Background:
- Carbon nanotubes (CNTs) are promising field emitters due to their unique electrical and mechanical properties.
- Field emission devices are crucial for applications in displays, X-ray sources, and microfabrication.
Purpose of the Study:
- To fabricate a novel field emission device using titanium oxide (TiO(2)) encapsulated carbon nanotubes (CNTs).
- To investigate the potential of this device for nanolithography and the fabrication of field-effect transistors.
Main Methods:
- Vertically aligned CNTs were grown on silicon substrates via plasma-enhanced chemical vapor deposition (PECVD).
- CNTs were encapsulated with TiO(2) using atmospheric pressure chemical vapor deposition (APCVD).
- Field emission was achieved through mechanical polishing, and device performance was characterized electrically.
Main Results:
- The fabricated TiO(2)/CNT structure demonstrated field emission capabilities.
- A variable electron beam spot size of less than 30 nm was achieved by controlling the TiO(2) gate voltage.
- Electrical measurements confirmed the device's suitability for fabricating field-emission-based field-effect transistors.
Conclusions:
- The developed TiO(2)/CNT field emission device shows significant potential for high-resolution nanolithography.
- The gate control mechanism allows for precise modulation of the emission current, essential for transistor fabrication.
- This technology offers a pathway for advanced micro- and nanofabrication techniques.

