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Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle

Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
The ions and electrons produced interact with the fluctuating magnetic field created by a water-cooled...
Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview01:19

Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview

In inductively coupled plasma–mass spectrometry (ICP–MS), an inductively coupled plasma (ICP) torch is used as an atomizer and ionizer. Solid samples are dissolved and volatilized before being introduced into the high-temperature argon plasma, while solution samples are nebulized and passed through the high-temperature argon plasma. Plasma dissociates the analytes and ionizes their component atoms to form a mixture of positive ions and molecular species. The positive ions are then passed on to...
Atomic Emission Spectroscopy: Overview01:20

Atomic Emission Spectroscopy: Overview

Atomic emission spectroscopy (AES) is an analytical technique used to determine the elemental composition of a sample by analyzing the light emitted from excited atoms. In AES, atoms in a sample are excited to higher energy levels by thermal energy from high-temperature sources, such as plasma, arcs, or sparks. When these excited atoms return to lower energy states, they emit light at specific wavelengths characteristic of each element. The resulting atomic emission spectrum, which consists of...
Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used.
Atomic Emission Spectroscopy: Instrumentation01:22

Atomic Emission Spectroscopy: Instrumentation

The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.
Atomic Emission Spectroscopy: Lab01:29

Atomic Emission Spectroscopy: Lab

AES is a powerful analytical technique, especially effective when used with plasma sources, producing abundant spectra in characteristic emission lines. The Inductively Coupled Plasma (ICP), in particular, yields superior quantitative analytical data due to its high stability, low noise, low background, and minimal interferences under optimal experimental conditions. However, newer air-operated microwave sources are emerging as promising alternatives that could be more cost-effective than...

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Updated: May 14, 2026

Implementation of a Hyperbolic Vortex Plasma Reactor for the Removal of Micropollutants in Water
06:35

Implementation of a Hyperbolic Vortex Plasma Reactor for the Removal of Micropollutants in Water

Published on: July 25, 2025

Multifunctional bulk plasma source based on discharge with electron injection.

A S Klimov1, A V Medovnik, A V Tyunkov

  • 1Tomsk State University of Control Systems and Radioelectronics, Tomsk 634050, Russia.

The Review of Scientific Instruments
|February 8, 2013
PubMed
Summary
This summary is machine-generated.

A novel bulk plasma source utilizes electron injection and a unique sputter-electrode array for extended operational life and versatile material deposition. This advanced plasma generation technology enables multifunctional coatings from various gases.

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Area of Science:

  • Materials Science
  • Plasma Physics
  • Surface Engineering

Background:

  • Conventional plasma sources often suffer from limited lifetimes and maintenance requirements.
  • Developing robust and versatile plasma generation systems is crucial for advanced material processing.

Purpose of the Study:

  • To describe a novel bulk plasma source with enhanced longevity and multifunctional capabilities.
  • To detail the design features contributing to extended operational periods and diverse applications.

Main Methods:

  • Utilized a high-current direct current (dc) glow discharge with electron injection.
  • Incorporated a plasma arc emitter with special design features for durability.
  • Employed a sectioned sputter-electrode array with six independently biased sputter targets.

Main Results:

  • Achieved very long periods between maintenance down-times and a long overall source lifetime.
  • Demonstrated multifunctional operation, enabling plasma generation from various gases (argon, nitrogen, oxygen, acetylene).
  • Successfully deposited composite metal nitride and oxide coatings.

Conclusions:

  • The described bulk plasma source offers significant improvements in reliability and operational lifetime.
  • The multifunctional design allows for versatile plasma generation and advanced composite coating deposition.
  • This technology holds promise for applications in surface engineering and materials science.