An atomic layer deposition reactor with dose quantification for precursor adsorption and reactivity studies.

T J Larrabee1, T E Mallouk, D L Allara

  • 1Department of Chemistry, The Pennsylvania State University, University Park, Pennsylvania 16802, USA.

Summary

A new atomic layer deposition reactor precisely controls precursor doses for studying adsorption. This enables accurate film growth control by relating gas exposure to fluid dynamics.

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