Related Experiment Video
Updated: May 13, 2026

Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon
Published on: July 17, 2020
Indirect to direct band gap transition in ultra-thin silicon films
Linhan Lin1, Zhengcao Li, Jiayou Feng
1Department of Materials Science and Engineering, Key Lab of Advanced Materials, Tsinghua University, Beijing 100084, People's Republic of China.
Abstract:
Free standing silicon layers undergo a transition from indirect to direct band gap semiconductor, which predicts a new possible way in silicon band gap engineering. The thickness and crystal orientation of the exposed surface are crucial. Our simulations reveal that the (100) films with thickness of ∼1.05 nm and (110) films with thickness of ∼1.14 nm could maintain the direct band gap structure. However, the (111) films always show indirect band gap structure even if the monolayer is constructed. The electron states density calculations were also carried out and the transition of the band gap structure is considered to be determined by the quantum confinement and surface termination conditions. The momentum matrix element calculations were also carried out, approving the effective direct band gap transitions for these ultra-thin films.
Related Concept Videos
Types of Semiconductors
Semiconductors
Metals such as copper (Cu), zinc (Zn), or lead (Pb) have low resistivity and feature conduction bands that are either not fully occupied or overlap with the valence band, making a bandgap non-existent. This allows electrons in the highest energy levels of the valence band to easily transition to the conduction band upon gaining...
Energy Bands in Solids
Band Formation:
When atoms are brought close together, as in a solid, these discrete energy levels begin to split due to the overlap of electron orbitals from adjacent atoms. This split occurs because of the Pauli exclusion principle, which states that no two...
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The semiconductor's...
Fermi Level Dynamics
Electron affinity in semiconductors refers to the energy gap between the minimum of its conduction band and the vacuum level and it is a critical parameter in determining how easily a semiconductor can accept additional electrons.
The work...
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...

