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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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Dissolution of synthetic uranium dibutyl phosphate deposits in oxidizing and reducing chemical formulations

A L Rufus1, V S Sathyaseelan1, S V Narasimhan1

  • 1Water and Steam Chemistry Division, Bhabha Atomic Research Centre Facilities, Kalpakkam 603102, TN, India.

Journal of Hazardous Materials
|April 30, 2013
PubMed

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