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Updated: May 11, 2026

In Situ SIMS and IR Spectroscopy of Well-defined Surfaces Prepared by Soft Landing of Mass-selected Ions
Published on: June 16, 2014
Ageing dynamics of ion bombardment induced self-organization processes
Oier Bikondoa1, Dina Carbone, Virginie Chamard
1XMaS, The UK-CRG Beamline, European Synchrotron Radiation Facility, B.P. 220, F-38043 Grenoble cedex 09, France. oier.bikondoa@esrf.fr
Abstract:
Instabilities caused during the erosion of a surface by an ion beam can lead to the formation of self-organized patterns of nanostructures. Understanding the self-organization process requires not only the in-situ characterization of ensemble averaged properties but also probing the dynamics. This can be done with the use of coherent X-rays and analyzing the temporal correlations of the scattered intensity. Here, we show that the dynamics of a semiconductor surface nanopatterned by normal incidence ion beam sputtering are age-dependent and slow down with sputtering time. This work provides a novel insight into the erosion dynamics and opens new perspectives for the understanding of self-organization mechanisms.
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