Threshold levels of dual electrode stimulation in cochlear implants

Jorien Snel-Bongers1, Jeroen J Briaire, Erika H van der Veen

  • 1ENT-department, Leiden University Medical Centre, PO box 9600, 2300, RC, Leiden, The Netherlands, j.snel-bongers@lumc.nl.

Summary

Dual electrode stimulation in cochlear implants effectively creates intermediate pitches at low levels. This study found no significant threshold differences, suggesting current steering eliminates the need for corrections in hearing restoration.

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