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Updated: May 10, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

The range and intensity of backscattered electrons for use in the creation of high fidelity electron beam lithography

David A Czaplewski1, Martin V Holt, Leonidas E Ocola

  • 1Center for Nanoscale Materials, Argonne National Laboratory, 9700 S. Cass Avenue Building 440, Argonne, IL 60439, USA.

Nanotechnology
|July 3, 2013
PubMed

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