Simulated annealing-simplex hybrid algorithm for ellipsometric data inversion of multilayer films

Area of Science:

• Materials Science
• Optical Physics
• Computational Modeling

Background:

• Ellipsometry is crucial for characterizing thin films.
• Accurate optical parameter determination is essential for multilayer film analysis.
• Existing methods face challenges with thin or complex multilayer structures.

Purpose of the Study:

• To develop and validate a hybrid algorithm for accurate optical parameter measurement of multilayer films.
• To address the challenges in ellipsometric data inversion for multilayer systems.
• To enhance the reliability of optical characterization for thin and complex films.

Main Methods:

• A simulated annealing-simplex hybrid algorithm was developed.
• The algorithm was applied to ellipsometric data inversion.
• Single-wavelength ellipsometry with multiple incident angles was utilized.

Main Results:

• The hybrid algorithm accurately measures optical parameters of multilayer films.
• Measurement accuracy was validated, showing feasibility and reliability.
• The algorithm demonstrated effectiveness even for thinner films where uncertainty typically increases.

Conclusions:

• The simulated annealing-simplex hybrid algorithm provides a feasible and reliable method for optical parameter inversion of multilayer films.
• This approach enhances measurement accuracy in single-wavelength ellipsometry.
• The algorithm is applicable to both double-layer and complex multilayer film characterization.