Preparation and microstructure of nanocrystalline Ni-Mo films

Ni-Mo films were prepared by electrodeposition technique with citric acid as a complexing agent. The influence of the main technical parameters such as the concentration of Na2MoO4 x 2H2O, the current density, the bath temperature and pH on the component content in the Ni-Mo films were investigated by energy dispersive spectrometer (EDS), the microstructure and surface morphology of Ni-Mo films were characterized by employing X-ray diffractometer (XRD) and scanning electron microscope (SEM). The results showed that the excellent Ni-Mo films with 35.51 wt% Mo was obtained when the concentration of Na2MoO4 x 2H2O was 15 g/L, the current density was 8 A/dm2, the bath temperature was 30 degrees C and the pH was 5.0. The mircostructure of the Ni-Mo films were nanocrystalline and the average size of grain was about 20.12 nm by calculating using Scherrer Equation.