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Design and sub-beam phase measurement of Dammann grating with three-phase array output
Bing Li1, Ya'nan Zhi, Jianfeng Sun
1Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China.
Optics Letters
|August 2, 2013
Summary
Researchers developed an improved Dammann grating (DG) for equal-intensity spot arrays. This innovation simplifies optical systems by reducing phase complexity, enabling efficient beam splitting applications.
Area of Science:
- Optics and Photonics
- Micro-optics and Diffractive Optics
Background:
- Dammann gratings (DGs) are crucial for beam splitting applications.
- Existing DGs often require complex phase structures, limiting their practical implementation.
- Need for efficient, phase-reduced DGs for advanced optical systems.
Purpose of the Study:
- To propose an improved Dammann grating (DG) design.
- To achieve an equal-intensity spot array with a reduced number of phases (three phases).
- To present numerical and experimental validation of the proposed DG.
Main Methods:
- Numerical simulations were performed for 1x4 and 1x5 DGs.
- A 4x4 two-phase DG was fabricated using very-large-scale integration (VLSI) techniques.
- A novel phase-shift-interferometry technique was developed for measuring grating intensity and sub-beam phases.
Main Results:
- The proposed DG design successfully generates equal-intensity spot arrays with only three phases.
- Numerical solutions demonstrated the feasibility for 1x4 and 1x5 configurations.
- Experimental performance measurements of the fabricated 4x4 two-phase DG confirmed the design's effectiveness.
Conclusions:
- The improved Dammann grating offers a simplified phase structure for generating equal-intensity spot arrays.
- VLSI fabrication and phase-shift interferometry provide viable methods for creating and characterizing advanced DGs.
- This advancement has potential applications in optical interconnects, laser material processing, and display technologies.

