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Updated: May 7, 2026

In Situ SIMS and IR Spectroscopy of Well-defined Surfaces Prepared by Soft Landing of Mass-selected Ions
Published on: June 16, 2014
Brent A Sperling1, John Hoang, William A Kimes
1Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
This study introduces a new method for real-time surface infrared spectroscopy during atomic layer deposition (ALD). The technique uses a rapid-scan Fourier transform infrared (FT-IR) spectrometer and a buried metal layer (BML) substrate for enhanced surface analysis.
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