Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

Gas Chromatography: Types of Detectors-II01:19

Gas Chromatography: Types of Detectors-II

1.5K
In gas chromatography, different detectors are employed to meet specific analytical needs. These detectors are often categorized based on their detection mechanisms and the types of compounds they are best suited to analyze. Thermal Conductivity Detectors (TCD), Flame Ionization Detectors (FID), and Electron Capture Detectors (ECD) represent common categories, each with unique operating principles and applications. However, beyond these, several other detectors are designed for more specialized...
1.5K
Atomic Absorption Spectroscopy: Atomization Methods01:25

Atomic Absorption Spectroscopy: Atomization Methods

2.0K
Atomic Absorption Spectroscopy (AAS) atomizes samples through flame atomization or electrothermal atomization. Flame atomization typically involves a nebulizer and spray chamber assembly to combine the sample with a fuel–oxidant mixture, creating a fine aerosol mist that enters a burner. Typically, the fuel and oxidant are combined in an approximately stoichiometric ratio. However, for atoms that are easily oxidized, a fuel-rich mixture may be more advantageous. Only about 5% of the...
2.0K

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Nondispersive Ultraviolet Visible Gas Analyzer for Monitoring Molybdenum Chloride and Oxychloride Precursors During Vapor Deposition Processes.

Applied spectroscopy·2024
Same author

Ultraviolet-Visible Absorption Spectroscopy of MoCl<sub>5</sub>, MoOCl<sub>4</sub>, and MoO<sub>2</sub>Cl<sub>2</sub> Vapors.

The journal of physical chemistry. A·2023
Same author

GaSb band-structure models for electron density determinations from Raman measurements.

Journal of applied physics·2023
Same author

Common Single-Use Consumer Plastic Products Release Trillions of Sub-100 nm Nanoparticles per Liter into Water during Normal Use.

Environmental science & technology·2022
Same author

Extracting electron densities in <i>n</i>-type GaAs from Raman spectra: Comparisons with Hall measurements.

Journal of applied physics·2021
Same author

Nondispersive Infrared Gas Analyzer for Partial Pressure Measurements of a Tantalum Alkylamide During Vapor Deposition Processes.

Applied spectroscopy·2019
Same journal

EXPRESS: Deterministic Compressed Sensing in Time-Domain Spectroscopy.

Applied spectroscopy·2026
Same journal

EXPRESS: Multi-Parameter Wavelength Characterization of Array Spectrometers Under Near-Limit Sampling Conditions.

Applied spectroscopy·2026
Same journal

EXPRESS: A Validated Reference Database for Twentieth-Century Cd-Based Pigments: Integrated Structural and Compositional Characterization.

Applied spectroscopy·2026
Same journal

EXPRESS: Two-Trace Two-Dimensional (2T2D-COS) in the Analysis of Brain Tissue Sample Preparation Method.

Applied spectroscopy·2026
Same journal

EXPRESS: Simplified Protocol for Analyzing Polarization Properties of Scanning Tunneling Microscope (STM) Light Emission Spectra at an Oblique Angle.

Applied spectroscopy·2026
Same journal

EXPRESS: Monitoring a Polyurethane Synthesis by Fiber-Coupled Attenuated Total Reflection Fourier Transform Infrared Spectroscopy and Multivariate Curve Resolution-Alternating Least Squares.

Applied spectroscopy·2026
See all related articles

Related Experiment Video

Updated: Apr 13, 2026

Chemical Vapor Deposition of an Organic Magnet, Vanadium Tetracyanoethylene
08:25

Chemical Vapor Deposition of an Organic Magnet, Vanadium Tetracyanoethylene

Published on: July 3, 2015

11.4K

Visualizing Molybdenum Pentachloride Flow During Vapor Deposition Processes Using Absorption Imaging.

James E Maslar1, Berc Kalanyan1

  • 1Material Measurement Laboratory, National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899, USA.

Applied Spectroscopy
|March 13, 2025
PubMed
Summary
This summary is machine-generated.

A new absorption imaging technique visualizes molybdenum pentachloride (MoCl5) flow in atomic layer deposition. This method helps optimize precursor delivery for uniform thin film growth by analyzing flow patterns under different conditions.

Keywords:
Absorption imagingMoCl5atomic layer depositionchemical vapor depositionflow imagingmolybdenum pentachloride

More Related Videos

Reactive Vapor Deposition of Conjugated Polymer Films on Arbitrary Substrates
07:32

Reactive Vapor Deposition of Conjugated Polymer Films on Arbitrary Substrates

Published on: January 17, 2018

33.7K
Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
11:10

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model

Published on: May 23, 2018

11.8K

Related Experiment Videos

Last Updated: Apr 13, 2026

Chemical Vapor Deposition of an Organic Magnet, Vanadium Tetracyanoethylene
08:25

Chemical Vapor Deposition of an Organic Magnet, Vanadium Tetracyanoethylene

Published on: July 3, 2015

11.4K
Reactive Vapor Deposition of Conjugated Polymer Films on Arbitrary Substrates
07:32

Reactive Vapor Deposition of Conjugated Polymer Films on Arbitrary Substrates

Published on: January 17, 2018

33.7K
Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
11:10

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model

Published on: May 23, 2018

11.8K

Area of Science:

  • Materials Science
  • Chemical Engineering
  • Optical Physics

Background:

  • Atomic Layer Deposition (ALD) and Pulsed Chemical Vapor Deposition (pCVD) are crucial for thin film fabrication.
  • Controlling precursor flow dynamics is essential for achieving uniform film properties.
  • Existing methods for visualizing precursor flow in deposition chambers are limited.

Purpose of the Study:

  • To develop and demonstrate an absorption imaging technique for real-time visualization of molybdenum pentachloride (MoCl5) vapor flow.
  • To analyze the impact of carrier gas flow rate and chamber pressure on MoCl5 flow patterns.
  • To assess the utility of the technique for optimizing ALD/pCVD processes.

Main Methods:

  • Utilized a telecentric lens, a 7.1 MP CMOS camera, and a 443 nm LED light source for absorption imaging.
  • Recorded MoCl5 flow dynamics at approximately 93 frames per second within a deposition chamber.
  • Compared MoCl5 flow patterns under low and high flow rate/pressure conditions.

Main Results:

  • Low flow/pressure conditions showed gradual MoCl5 expansion and short residence time, leading to uniform precursor fronts and efficient exhaust.
  • High flow/pressure conditions revealed high-velocity jets and recirculation zones, resulting in longer residence times and potential non-uniformity.
  • The technique provided qualitative characterization of precursor flow fields with minimal data processing.

Conclusions:

  • The developed absorption imaging technique effectively visualizes MoCl5 flow dynamics in ALD/pCVD.
  • Optimized flow conditions (low flow rate, low pressure) promote uniform precursor delivery for better thin film deposition.
  • The technique's data can support computational fluid dynamics model validation and future 3D analysis.