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Ultraviolet-Visible Absorption Spectroscopy of MoCl5, MoOCl4, and MoO2Cl2 Vapors.

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This study quantifies vapor-phase absorption spectra for molybdenum pentachloride (MoCl5) and its oxychlorides. MoCl5 exhibits a unique spectral fingerprint, enabling its differentiation from related compounds in visible wavelengths.

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Area of Science:

  • Physical Chemistry
  • Spectroscopy
  • Materials Science

Background:

  • Understanding the spectral properties of molybdenum compounds is crucial for their application in materials science.
  • Molybdenum pentachloride (MoCl5) is a precursor in thin-film deposition, but its spectral characteristics and purity in vapor phase are not well-defined.
  • Distinguishing MoCl5 from its oxychlorides (MoOCl4, MoO2Cl2) is important for process control.

Purpose of the Study:

  • To obtain quantitative absorption spectra of MoCl5, MoOCl4, and MoO2Cl2 in the vapor phase.
  • To identify a unique spectral signature for MoCl5 to differentiate it from its oxychlorides.
  • To investigate the adsorption behavior of MoCl5 on surfaces relevant to thin-film deposition.

Main Methods:

  • Quantitative absorption spectroscopy was performed on MoCl5, MoOCl4, and MoO2Cl2 in the vapor phase (45,500–15,500 cm⁻¹).
  • Measurements were conducted in a vacuum system using rapid sampling and a differential absorbance method to ensure accuracy.
  • Analysis included replicate measurements, time-resolved spectra, absorbance-pressure curves, and spectral peak fitting.

Main Results:

  • Reproducible spectral responses were obtained for MoCl5 vapors at 120 °C.
  • Analysis indicated the unlikely presence of HCl and MoOCl4 impurities in MoCl5 samples.
  • A unique spectral fingerprint for MoCl5 was identified at 28,500 cm⁻¹, distinct from MoOCl4 and MoO2Cl2.

Conclusions:

  • MoCl5 exhibits a distinct visible-wavelength spectral fingerprint, facilitating its identification and differentiation from oxychlorides.
  • The study provides a reliable method for assessing MoCl5 purity in vapor-phase processes.
  • The findings support the use of MoCl5 as a reactant in vapor-phase thin-film deposition.