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Updated: May 7, 2026
Scalable Solution-processed Fabrication Strategy for High-performance, Flexible, Transparent Electrodes with Embedded Metal Mesh
Published on: June 23, 2017
Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio
So Youn Kim1, Jessica Gwyther, Ian Manners
1Department of Chemical and Biological Engineering, Princeton University, Princeton, NJ, 08544, USA.
Abstract:
Highly selective etch masks are formed by thin films of a polystyrene-b-poly(ferrocenylisopropylmethylsilane) diblock copolymer, PS-PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS-PFiPMS templates are employed to fabricate high-aspect-ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency.
