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Updated: May 6, 2026
Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
Published on: July 2, 2012
Challenging material patterning: fine lithography on coarse substrates
Sandra Gilles1, Ann-Kathrin Steppert, Patrick A Schaal
1Institute of Inorganic Chemistry, RWTH Aachen University, Aachen, Germany; JARA-Fundamentals of Future Information Technology, RWTH Aachen University, Aachen, Germany.
Abstract:
Precise patterning of inorganic materials is important for many technological applications. Often lithography processes are required on challenging substrates with respect to topography, flexibility, and surface adhesion. Here we show the fabrication of artificial gunshot residues (GSR) on adhesive tape samples by means of dip-pen lithography as an example for fine lithography on coarse substrates. We deposited lead-, barium-, and antimony-containing inks on SEM adhesive tape by direct writing with a fine tip. Single as well as multiple element structures with dimensions in the range of 10-75 µm were fabricated.
