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Updated: May 4, 2026

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
In situ and non-volatile bandgap tuning of multilayer graphene oxide in an all-solid-state electric double-layer
Takashi Tsuchiya1, Kazuya Terabe, Masakazu Aono
1International Center for Materials Nanoarchitechtonics (WPI-MANA), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki, 305-0044, Japan.
Abstract:
The sp(2) /sp(3) domain fraction of multilayer graphene oxide (GO) is tuned in situ and in a non-volatile manner by using a proton-induced redox reaction at the interface of GO and the yttria-stabilized zirconia proton-conductor. This method opens the door for transparent, ultrathin, flexible, and low cost carbon-nanoionics devices that can control not only electronic transport, but also other properties such as photoluminescence and optics.
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