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Published on: June 27, 2022
Beam loading by distributed injection of electrons in a plasma wakefield accelerator
N Vafaei-Najafabadi1, K A Marsh1, C E Clayton1
1Department of Electrical Engineering, University of California Los Angeles, Los Angeles, California 90095, USA.
Electron bunch propagation in plasma causes electron injection, reducing the accelerating field. This beam loading effect, caused by rubidium ionization, lowers the transformer ratio, impacting particle acceleration efficiency.
Area of Science:
- Plasma physics
- Particle acceleration
- Beam-plasma interactions
Background:
- Relativistic electron bunches are used for particle acceleration.
- Plasma wakefields can support strong accelerating fields.
- Beam loading can significantly impact wakefield dynamics.
Purpose of the Study:
- To investigate the effects of electron bunch propagation on plasma wakefields.
- To quantify the impact of beam loading on the transformer ratio.
- To identify the source of injected electrons and their role in wakefield depletion.
Main Methods:
- Experimental studies of relativistic electron bunch propagation through plasma.
- Supporting simulations to model wakefield dynamics and electron injection.
- Measurement of electron energy gain and loss as a function of beam emittance and loading.
Main Results:
- Distributed electron injection observed, originating from rubidium (Rb II) ionization.
- Significant beam loading effect demonstrated, reducing the transformer ratio (T).
- Peak accelerating field reduced from 43 GV/m (weakly loaded) to 26 GV/m (strongly loaded) due to Rb II electron injection.
Conclusions:
- Ionization of Rb II electrons is a primary source of beam loading in this plasma.
- Beam loading severely depletes the accelerating wakefield, reducing transformer ratio and acceleration efficiency.
- Understanding and mitigating beam loading is crucial for advanced plasma-based accelerators.
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