Effective thermal resistance of a photonic crystal microcavity

We present a simple method to accurately measure the effective thermal resistance of a photonic crystal microcavity. The cavity is embedded between two Schottky contacts forming a metal-semiconductor-metal device. The photocarriers circulating in the device provide a local temperature rise that can be dominated by Joule effect under certain conditions. We show that the effective thermal resistance (R(th)) can be experimentally deduced from the spectral shift of the cavity resonance wavelength measured at different applied bias. We deduce a value of R(th)1.6×10(4) KW(-1) for a microcavity on silicon-on-insulator, which is in good agreement with 3D thermal modeling by finite elements.