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Planar surface implanted diffractive grating couplers in SOI.

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    This study introduces a novel grating coupler using lattice disorder for efficient light coupling in silicon photonics. This method improves surface planarity for advanced integrated optical circuits.

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    Area of Science:

    • Photonics and Materials Science
    • Integrated Optics
    • Semiconductor Device Fabrication

    Background:

    • Grating couplers enable efficient light transfer between optical fibers and silicon waveguides without cleaving.
    • Traditional surface relief gratings compromise surface planarity, hindering multi-layer integrated optical circuit fabrication.
    • Improved grating coupler fabrication is crucial for advanced optical and electronic circuit integration.

    Purpose of the Study:

    • To demonstrate a novel grating coupler utilizing refractive index change induced by lattice disorder.
    • To assess the performance of this new coupler for integrated optical circuits.
    • To overcome limitations of traditional surface relief grating fabrication.

    Main Methods:

    • Utilizing lattice disorder to introduce refractive index changes for grating coupler functionality.
    • Simulating power extraction efficiency of uniform implanted gratings.
    • Empirically determining coupler losses.

    Main Results:

    • Simulations predict 44% power extraction from the waveguide using uniform implanted gratings.
    • Performance is comparable to conventional uniform surface relief gratings.
    • Empirically measured losses of 5.5 dB per coupler were achieved.

    Conclusions:

    • A novel grating coupler based on refractive index change via lattice disorder has been successfully demonstrated.
    • This approach offers improved surface planarity for multi-layer integrated optics.
    • The method shows potential for wafer-scale testing and advanced photonic integration.