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Updated: May 2, 2026

Non-equilibrium Microwave Plasma for Efficient High Temperature Chemistry
Published on: August 1, 2017
Hollow metal target magnetron sputter type radio frequency ion source
N Yamada1, T Kasuya1, N Tsubouchi2
1Graduate School of Science and Engineering, Doshisha University, Kyoto 610-0321, Japan.
Abstract:
A 70 mm diameter 70 mm long compact ion source equipped with a hollow sputtering target has been designed and tested. The hollow sputtering target serves as the radio frequency (RF) plasma excitation electrode at 13.56 MHz. A stable beam of Cu(+) has been extracted when Ar was used as the discharge support gas. In the extracted beam, Cu(+) had occupied more than 85% of the total ion current. Further increase in Cu(+) ions in the beam is anticipated by increasing the RF power and Ar pressure.
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