Related Experiment Video
Updated: May 2, 2026

Tuning Oxide Properties by Oxygen Vacancy Control During Growth and Annealing
Published on: June 9, 2023
Oxygen vacancy formation and annihilation in lanthanum cerium oxide as a metal reactive oxide on 4H-silicon carbide
Way Foong Lim1, Kuan Yew Cheong
1Electronic Materials Research Group, School of Materials & Mineral Resources Engineering, Universiti Sains Malaysia, Engineering Campus, 14300 Nibong Tebal, Penang, Malaysia. cheong@eng.usm.my wayfoong317@yahoo.com.sg.
Abstract:
A mechanism regarding the redox reaction in lanthanum cerium oxide (LaxCeyOz) post-deposition annealed in reducing and oxidizing atmosphere was schematized and discussed in association with the presence of lanthanum as a substitutional cation. Analyses have been performed using X-ray diffraction, energy-filtered transmission electron microscopy, scanning transmission electron microscope-energy dispersive spectroscopy line scan, and capacitance-voltage measurements. The results showed the presence of an oxygen vacancy when La(3+) was in its substitution site, while annihilation of oxygen vacancy was accompanied by a displacement of La(3+) from the substitutional site to the interstitial site via a kick-out mechanism prior to its disappearance from the CeO2.
Related Concept Videos
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
Imperfections in Crystal Structure: Non-Stoichiometric Defects
Imperfections in Crystal Structure: Stoichiometric Point Defects

