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Updated: May 2, 2026

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
A general route towards defect and pore engineering in graphene.
Guibai Xie1, Rong Yang, Peng Chen
1Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China.
Defect engineering in graphene is achieved using remote plasma treatments. This method allows for controlled creation and enlargement of defects into nanopores, enabling tailored graphene properties for advanced applications.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Science
Background:
- Defect engineering is crucial for customizing graphene's properties.
- Graphene's unique characteristics make it suitable for applications like porous membranes and ultra-capacitors.
Purpose of the Study:
- To present a general method for defect and pore engineering in graphene.
- To demonstrate control over defect density and nanopore size.
Main Methods:
- Utilizing remote plasma treatments, specifically oxygen plasma irradiation.
- Employing hydrogen plasma anisotropic etching to enlarge defects into nanopores.
Main Results:
- Homogeneous defects in graphene were created with controllable densities (few to ≈10^3 μm⁻²).
- Defects were successfully enlarged into nanopores with sizes of a few nm and above.
- The smallest fabricated nanopores were approximately 2 nm in size.
Conclusions:
- Remote plasma treatment offers a versatile route for graphene defect and pore engineering.
- This technique enables the fabrication of ultra-small graphene nanopores.
- The controlled modification of graphene structures opens possibilities for novel applications.
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