Related Experiment Video
Updated: May 2, 2026

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
Bulk mixed ion electron conduction in amorphous gallium oxide causes memristive behaviour
Yoshitaka Aoki1, Carsten Wiemann2, Vitaliy Feyer2
11] Institute of Physical Chemistry, RWTH Aachen University and JARA-FIT, 52056 Aachen, Germany [2].
This study reveals that oxygen ion movement in amorphous gallium oxide (GaOx) thin films enables non-filamentary resistive switching. This ion migration at room temperature is key to the tunable memristive behavior observed in these materials.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Memristive devices offer promising non-volatile memory and neuromorphic computing applications.
- Understanding the switching mechanisms in resistive switching materials is crucial for device optimization.
Purpose of the Study:
- To investigate non-filamentary memristive switching in amorphous gallium oxide (GaOx) thin films.
- To elucidate the role of oxygen ion conductivity in enabling resistive switching behavior.
Main Methods:
- Fabrication of amorphous GaOx thin films sandwiched between ion-blocking electrodes.
- Utilizing photoemission and transmission electron microscopy to observe ion migration.
- Characterizing the electrical transport properties and I-V hysteresis loops.
Main Results:
- Direct observation of reversible oxygen ion enrichment and depletion at electrodes.
- Demonstration of room-temperature memristive switching driven by oxygen ion mobility.
- Tunable hysteresis loop shapes (figure-eight to triangle) influenced by bias history.
Conclusions:
- Oxygen ion conductivity in amorphous GaOx is the primary mechanism for non-filamentary resistive switching.
- The observed memristive behavior is governed by coupled ion drift-diffusion dynamics.
- The oxygen concentration profile acts as a state function, enabling tunable device characteristics.
Related Concept Videos
MOS Capacitor
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
Semiconductors
Metals such as copper (Cu), zinc (Zn), or lead (Pb) have low resistivity and feature conduction bands that are either not fully occupied or overlap with the valence band, making a bandgap non-existent. This allows electrons in the highest energy levels of the valence band to easily transition to the conduction band upon gaining...
MOSFET: Enhancement Mode
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
Band Theory
The energy difference between these bands is known as the band gap.
Conductor, Semiconductor,...

