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A single-step reaction for silicon and germanium nanorods
1Department of Chemical Engineering, Texas Materials Institute, Center for Nano- and Molecular Science and Technology, The University of Texas at Austin, Austin, TX 78712-1062 (USA), Fax: (+1) 512-471-7060.
Abstract:
A single-step reaction has been developed for colloidal quantum-size silicon (Si) and germanium (Ge) nanorods. The nanorods are formed by solution-liquid-solid (SLS) growth from tin (Sn) seed particles prepared by in situ reduction of a molecular tin(II) complex by trisilane, the reactant for Si nanorod growth. Using the same procedure, Ge nanorods can be grown by including a diphenyl germane reactant. The nanorod length could be adjusted from several nanometers to more than a micrometer without significant increase of diameter by manipulating reactant concentrations.
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