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Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
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The development of a 200 kV monochromated field emission electron source

Masaki Mukai1, Judy S Kim2, Kazuya Omoto1

  • 1JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan.

Ultramicroscopy
|March 25, 2014
PubMed

Keywords:
Aberration correctionElectron energy-loss spectroscopyEnergy resolutionHigh-resolution imagingMonochromatorWien filter

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