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Updated: May 1, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Jian Zhang1, Celal Con, Bo Cui
1Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo , Waterloo, Ontario N2L 3G1, Canada.
Thermal evaporation offers a simpler, more accessible method for applying electron beam resists like polystyrene, enabling high-resolution nanofabrication on irregular surfaces for advanced applications.
07:47Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
Published on: February 12, 2017
11:44Surface Enhanced Raman Spectroscopy Detection of Biomolecules Using EBL Fabricated Nanostructured Substrates
Published on: March 20, 2015
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