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    Poly(styrene-block-ferrocenyldimethylsilane) (PS-b-PFS) block copolymers enable nanoporous membranes and lithography masks. Reversing hybrid annealing order creates unique discontinuous lamellar and concentric ring patterns.

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    Area of Science:

    • Materials Science
    • Polymer Chemistry
    • Nanotechnology

    Background:

    • Poly(styrene-block-ferrocenyldimethylsilane) (PS-b-PFS) is a metal-containing block copolymer.
    • It offers advantages for nanoporous membranes and lithographic masks due to substrate compatibility, morphological control, and stability.

    Purpose of the Study:

    • To investigate the manipulation of phase-separated domain morphology in PS-b-PFS block copolymers.
    • To explore the effects of varying film thickness, annealing mode, and annealing time on film structure.
    • To understand how different hybrid annealing sequences influence morphology development.

    Main Methods:

    • Asymmetric cylinder-forming PS-b-PFS copolymer processing.
    • Control of film thickness, annealing mode (thermal, solvent, hybrid), and annealing time.
    • Sequential hybrid annealing (thermal then solvent, and solvent then thermal).

    Main Results:

    • Hybrid annealing (thermal then solvent) produced mesoscale spherulitic and dendritic morphologies.
    • Reversed hybrid annealing (solvent then thermal) on thick films yielded discontinuous lamellar structures.
    • Processing on flexible-window substrates resulted in sub-micron concentric ring patterns.

    Conclusions:

    • Film structure and domain morphology in PS-b-PFS are controllable via processing parameters.
    • The order of annealing steps in hybrid processing significantly impacts the resulting morphology.
    • Material mobility and substrate dynamics likely drive the formation of complex patterns.